{"id":168843,"date":"2022-12-26T14:19:59","date_gmt":"2022-12-26T14:19:59","guid":{"rendered":"https:\/\/harchi90.com\/huawei-patents-euv-lithography-tools-used-to-make\/"},"modified":"2022-12-26T14:19:59","modified_gmt":"2022-12-26T14:19:59","slug":"huawei-patents-euv-lithography-tools-used-to-make","status":"publish","type":"post","link":"https:\/\/harchi90.com\/huawei-patents-euv-lithography-tools-used-to-make\/","title":{"rendered":"Huawei patents EUV lithography tools used to make"},"content":{"rendered":"
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In context:<\/strong> Lithography machines are some of the most complex and expensive used in chip manufacturing. They generate steady beams of light in the ultraviolet spectrum and filter that light until it resembles the inverse of the floorplan of a microprocessor. They focus and point the light at a photosensitive wafer with a degree of precision in the tens of nanometers to carve out the floorplan. <\/p>\n
Huawei has patented one component used in EUV lithography systems that is required to make high-end processors on sub-10 nm nodes. It solves the problem of interference patterns created by the ultraviolet light that would otherwise make the wafer uneven.<\/p>\n
Huawei has solved an issue in the last step of chip manufacturing that’s caused by the tiny wavelengths of extreme ultraviolet (EUV) light. Its patent describes an array of mirrors that split the beam of light into multiple sub-beams that collide with their own microscopic mirrors. Each of those mirrors rotates differently to create different interference patterns in the light so that when they recombine, the interference patterns cancel out to create one uniform beam.<\/p>\n